Title | (Invited Paper) Materials and Processes for Next-Generation Innovative Devices |
Author | *Katsuaki Sato (Japan Science and Technology Agency, Japan) |
Page | pp. 119 - 120 |
Title | Growth Promotion of Al-Induced Crystallized Ge Thin-Films on Insulators by Enhancing Ge-Supply into Al Layers |
Author | *Kaoru Toko, Ryohei Numata, Koki Nakazawa (Univ. of Tsukuba, Japan), Noritaka Usami (Tohoku Univ., Japan), Takashi Suemasu (Univ. of Tsukuba, Japan) |
Page | pp. 121 - 122 |
Title | Formation of Tetragonal ZrO2 Thin Film by ALD Method |
Author | *Kimihiko Kato, Takatoshi Saito, Mitsuo Sakashita, Wakana Takeuchi, Noriyuki Taoka, Osamu Nakatsuka, Shigeaki Zaima (Nagoya Univ., Japan) |
Page | pp. 123 - 124 |
Title | Silicon-Germanium-Tin Microstructures Obtained through Mask Projection Assisted Pulsed Laser Induced Epitaxy |
Author | *Stefan Stefanov, Carmen Serra, Alessandro Benedetti, Jorge Carlos Conde (Univ. de Vigo, Spain), Jens Werner, Michael Oehme, Jörg Schulze (Institut für Halbleitertechnik (IHT), Germany), Stephan Wirths, Dan Mihai Buca (Forschungszentrum Jülich GmbH, Germany), Stefano Chiussi (Univ. de Vigo, Spain) |
Page | pp. 125 - 126 |