Title | (Invited Paper) Site-Controlled SiGe Islands on Patterned Si(001): Morphology, Composition Profiles, and Devices |
Author | *Jianjun Zhang (IFW Dresden, Germany/Univ. Linz, Austria/Univ. of New South Wales, Australia), Armando Rastelli (IFW Dresden, Germany/Univ. Linz, Austria), Nina Hrauda (Univ. Linz, Austria), Georgios Katsaros (IFW Dresden, Germany/Univ. Linz, Austria), Heiko Groiss, Julian Stangl, Friedrich Schäffler (Univ. Linz, Austria), Oliver G. Schmidt (IFW Dresden, Germany), Günther Bauer (Univ. Linz, Austria) |
Page | pp. 31 - 32 |
Title | Chemical Vapor Deposition Processes for the Fabrication of Epitaxial Si-O Superlattices |
Author | *Annelies Delabie, Suseendran Jayachandran, Matty Caymax, Roger Loo, Jens Maggen, Johan Meersschaut, Haraprasanna Lenka, Wilfried Vandervorst, Marc Heyns (IMEC, Belgium) |
Page | pp. 33 - 34 |
Title | Epitaxial Ge/Metallic Silicide Grown on Si with Atomically Smooth Heterointerfaces |
Author | *Shinya Yamada, Makoto Kawano, Kohei Tanikawa (Kyushu Univ., Japan), Kentarou Sawano (Tokyo City Univ., Japan), Masanobu Miyao, Kohei Hamaya (Kyushu Univ., Japan) |
Page | pp. 35 - 36 |
Title | Introducing Batch Epitaxy into High Volume Production for SiGe Channel Deposition |
Author | *Carsten Reichel, Joerg Schoenekess, Andreas Dietel (GLOBALFOUNDRIES Dresden, Germany) |
Page | pp. 37 - 38 |