Invited Speakers
(ICSI-8)

Speaker
Institution Country Title
Dan Mihai Buca Forschungszentrum Juelich GmbH Germany Design and growth of strained Ge/(Si)GeSn heterostructures for optical and electrical applications
Rodolfo Camacho-Aguilera Massachusetts Institute of Technology  USA CMOS Ge LASER: a bridge to the optical network
Albert Chin National Chiao Tung Univ. Taiwan High Channel Mobility Ge nMOSFET with Good Source-Drain Ohmic Contact and Small EOT
Giovanni Capellini Università Roma Tre,
IHP- Innovations for High Performance Microelectronics
Italy,
Germany
Strained Germanium Heterostructures for Infrared and Thz Light Emission
Mark A. Eriksson University of Wisconsin-Madison USA Measurements of a Hybrid Qubit for Silicon Quantum Computing
Claudiu V. Falub ETH Zürich (ETHZ) Switzerland 3D Heteroepitaxy of Mismatched Semiconductors on Silicon
Martin M. Frank IBM T.J. Watson Research Center  USA SiGe Channel Gate Stack Scaling: Oxygen scavenging and full metal gates
Kohei Hamaya Kyushu University Japan SiGe Spintronics with High-quality Ferromagnetic Metal-Semiconductor Heterostructures
Nobuyoshi Koshida Tokyo University of Agri. & Tech. Japan  Ballistic Electron Emission from Nanostructured Si Diode and Its Applications
John Kouvetakis Arizona State University USA Synthesis and Properties of Si-Ge-Sn Materials and Devices Grown by CVD
Roger Loo IMEC Belgium Epitaxial Growth Challenges for Advanced CMOS Devices
Yasuyoshi Nagai Tohoku University Japan In-depth Analysis of Defects and Impurities in Nano-scale Transistor Structures by 3D Atom Probe (tentative)
Michelle Y. Simmons University of New South Wales Australia Phosphorous Donor Qubits in Silicon
Jianjun Zhang Institute for Integrative Nanosciences, IFW Dresden Germany Site-controlled SiGe islands on patterned Si(001): Morphology, composition profiles, and devices

(ISCSI-VI)

Speaker
Institution Country Title
Tamotsu Hashizume Hokkaido University Japan Interface Control of GaN-Based Heterostrcutures for Power Switching Transistors
Katsuaki Sato Tokyo University of Agriculture and Technology Japan Materials and Processes for Next-Generation Innovative Devices
Tokuyuki Teraji NIMS Japan P-Type Diamond Schottky Interfaces -Current Transport Mechanisms and Thermal Stability
Yutaka Tokuda Aichi Institute of Technology Japan  DLTS Studies of Point Defects in MOCVD n-GaN
Raymond T. Tung
 
Brooklyn College, City University of New York USA  Schottky Barrier Height Adjustment through Interface Structure Engineering